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Charge injection at carbon nanotube- SiO2 interface
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Charge injection at carbon nanotube- SiO2 interface

Hock Guan Ong, Jun Wei Cheah, Lang Chen, Hosea Tangtang, Yanping Xu, Bing Li, Hua Zhang, Lain-Jong LiJunling Wang
Applied Physics Letters, 卷.93(9), 093509
2008

摘要

Physics and Astronomy (miscellaneous)
Most single-wall carbon nanotube field-effect transistors show significant hysteresis in their transfer characteristics between forward and reverse gate bias sweeps. It was proposed that the hysteresis is due to a dynamic charging process at the carbon nanotube-dielectric interface. We have studied the charge injection and subsequent discharging processes at the carbon nanotube- SiO2 interface using electrostatic force microscopy. It was observed that the water layer assists charge diffusion on the dielectric surface. © 2008 American Institute of Physics.

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https://doi.org/10.1063/1.2978249檢視
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