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Comparison of AlGalnP Light-Emitting Diodes on n- and p-GaAs Misoriented Substrates Prepared by Low-Pressure Metallorganic Vapor-Phase Epitaxy
Journal article   Open access   Peer reviewed

Comparison of AlGalnP Light-Emitting Diodes on n- and p-GaAs Misoriented Substrates Prepared by Low-Pressure Metallorganic Vapor-Phase Epitaxy

Jyh-Feng Lin, Meng-Chyi Wu and Biing-Jye Lee
Journal of the Electrochemical Society, Vol.142(4), pp.1293-1297
1995

Abstract

Electronic Optical and Magnetic Materials,Renewable Energy Sustainability and the Environment,Surfaces Coatings and Films,Electrochemistry,Materials Chemistry
The growth and characterization of AlGaInP double-heterostructure orange light-emitting diodes (LEDs) grown on n- and p-GaAs misoriented substrates by low-pressure metallorganic vapor-phase epitaxy are presented. Zinc and silicon are used as p- and n-type dopants for AlGaInP, respectively. The device performance is found to be strongly dependent on the doping concentration in both upper and lower cladding layers for the p-substrate LEDs. However, for the n-substrate LEDs, the strong dependence is only found on the doping concentration in the upper cladding layer. The degradation of device performance with increasing doping concentration in the cladding layer is thought to be due to the light absorption by deep levels. After optimizing the doping concentration in the LEDs, better LED performance can be obtained by using the p-type substrate. This demonstrates the feasibility of fabricating AlGaInP LEDs grown on p-GaAs substrates. © 1995, The Electrochemical Society, Inc. All rights reserved.
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