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Constructing a FMEA Framework for Improving the Manufacturing Processes in Semiconductor Industry and its Illustrations
Journal article   Peer reviewed

Constructing a FMEA Framework for Improving the Manufacturing Processes in Semiconductor Industry and its Illustrations

G. Fang, Chen-Fu. Chien, H. Wang, S. Hsu, D. Huang and C. Chen
Journal of the Chinese Institute of Industrial Engineers  Journal of the Chinese Institute of Industrial Engineers, Vol.17(2), pp.133-146
2000

Abstract

This study integrated Failure Mode Effect and Criticality Analysis, Fault Tree, and Event Tree methods to develop a research framework for improving process technology in semiconductor industry. We specified the steps of the required data and cost for the implementation of FMEA. In particular, we used three cases in a semiconductor fabrication for illustrations. We discussed the requirements for implementing FMEA at high-tech industries, and concluded with future research. We found that the proposed framework can be used as a basis for improving process technologies and managing domain knowledge and findings.

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