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Controlled ordering of block copolymer gyroid thin films by solvent annealing
Journal article   Peer reviewed

Controlled ordering of block copolymer gyroid thin films by solvent annealing

Ming-Shiuan She, Ting-Ya Lo and Rong-Ming Ho
Macromolecules, Vol.47(1), pp.175-182
14/01/2014

Abstract

This work presents an approach to achieve controlled ordering of polystyrene-block-poly(l-lactide) (PS-PLLA) gyroid thin films on a neutral substrate using solvent annealing. Interesting morphological evolution from gyroid to cylinder can be found while using a partially selective solvent for the PS block to anneal the PS-PLLA thin film. To acquire a thin-film sample with thermodynamically stable gyroid morphology, a nonpreferential solvent should be used for solvent annealing to enable controlled ordering of gyroid thin film with the (211) G plane parallel to the air surface and also the functionalized substrate. By taking advantage of degradable character of the PLLA block, nanoporous PS with well-defined texture can be fabricated by hydrolysis and used as a template for synthesis of various nanohybrids and nanoporous materials. © 2013 American Chemical Society.

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