Double exposure for the contact layer of the 65-nm node

Journal article

D.C. Owe-Yang, S.S. Yu, C.Y. Chang, B.C. Ho, C.H. Lin, H. Chen and 本堅林

SPIE Proceedings, Vol.5753, pp.171-180

2005

Abstract

Optical lithography;double exposure lithography;contact hole imaging

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Title: Double exposure for the contact layer of the 65-nm node
Creators - without role: D.C. Owe-Yang
S.S. Yu
C.Y. Chang
B.C. Ho
C.H. Lin
H. Chen
本堅林
Publication Details: SPIE Proceedings, Vol.5753, pp.171-180
Identifiers: 9957774442806774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Journal article