Logo image
返回
E-beam lithography and electrodeposition fabrication of thick nanostructured devices
期刊文章   同儕審查

E-beam lithography and electrodeposition fabrication of thick nanostructured devices

T.N. Lo, Y.T. Chen, C.W. Chiu, C.J. Liu, S.R. Wu, I.K. Lin, C.I. Su, W.D. Chang, Y. Hwu, B.Y. Shew, …
Journal of Physics D: Applied Physics, 卷.40(10), 頁碼.3172-3176
05/2007
DOI: https://doi.org/10.1088/0022-3727/40/10/021

摘要

Electronic Optical and Magnetic Materials Condensed Matter Physics Acoustics and Ultrasonics Surfaces Coatings and Films
A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices. © 2007 IOP Publishing Ltd.

相關連結

指標

1 檢視次數

詳細資料

Logo image