摘要
Indium tin oxide (ITO) films have been prepared by radio-frequency (rf) magnetron sputtering. The effect of oxygen concentration in the sputtering ambient on the structure and properties of ITO films are investigated. The films have a preferred orientation in the (440) plane. The presence of oxygen during sputtering enhances the crystallization of the film. Film grain size increases as more oxygen is added. According to the XPS measurements, the addition of oxygen reduces the oxygen-deficient region of the film. Hence the optical transmittance of the film is improved while film conductivity decreases.