Logo image
Effect of processing kinetics on the structure of ferromagnetic- ferroelectric-ferromagnetic interfaces
期刊文章   同儕審查

Effect of processing kinetics on the structure of ferromagnetic- ferroelectric-ferromagnetic interfaces

P.S. Sankara Rama Krishnan, Q.M. Ramasse, Wen-I Liang, Ying-Hao Chu, V. Nagarajan 和 P. Munroe
Journal of Applied Physics, 卷.112(10), 104102
11/2012

摘要

Physics and Astronomy (all)
Trilayer heterostructures consisting of a ferroelectric bismuth ferrite (BFO) film sandwiched between ferromagnetic lanthanum strontium manganese oxide (LSMO) films were fabricated using pulsed laser deposition. Both BFO thicknesses (20 nm, 5 nm) and cooling rates were varied to investigate the role of processing parameters on the chemistry of the interfaces. The interfaces were investigated using a dedicated aberration corrected scanning transmission electron microscope (STEM) operated at 100 kV via STEM-high angle annular dark field (STEM-HAADF) and STEM-electron energy loss spectroscopy (STEM-EELS) modes. Combined analysis through STEM-HAADF and STEM-EELS revealed the formation of lattice distortion in certain regions of the BFO layer for the ∼5 nm film. Piezoresponse force microscopy (PFM) studies of the ∼5 nm BFO sample revealed weak ferroelectric domain switching. Stacking fault defects with mixed valence manganese (Mn-B site cation) were formed in the top LSMO layer when the heterostructure was cooled at a slower rate irrespective of BFO thickness, thereby demonstrating the effect of processing kinetics on the physical integrity of the heterostructure. © 2012 American Institute of Physics.

相關連結

指標

1 檢視次數

詳細資料

Logo image