- 題名
- Effects of Wafer Temperature on Plasma Charging Induced Damage to MOS Gate Oxide
- 創作者：
- Shawming Ma - Integrated Systems Solutions (United States)James P. McVittie - Integrated Systems Solutions (United States)Krishna C. Saraswat - Integrated Systems Solutions (United States)
- 總頁數
- 3
- 補助款備註
- Semiconductor Research Corporation (http://data.elsevier.com/vocabulary/SciValFunders/100000028) Advanced Research Projects Agency (http://data.elsevier.com/vocabulary/SciValFunders/100009224)
- 學術資源類型
- 期刊文章
- 出版日期
- 01/12/1995
- 出版資訊
- IEEE electron device letters, 卷.16(12), 頁碼.534-536
- 語言
- 英語
期刊文章
Effects of Wafer Temperature on Plasma Charging Induced Damage to MOS Gate Oxide
IEEE electron device letters, 卷.16(12), 頁碼.534-536
01/12/1995
Web of Science ID: WOS:A1995TH28600001