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Effects of annealing temperature on electrical resistance of bonded n-GaAs wafers
Journal article   Peer reviewed

Effects of annealing temperature on electrical resistance of bonded n-GaAs wafers

Po Chun Liu, Cheng Lun Lu, Yewchung Sermon Wu, Ji-Hao Cheng and Hao Ouyang
Applied Physics Letters, Vol.85(21), pp.4831-4833
11/2004

Abstract

The electrical characteristics and microstructures of n -type (100) GaAs bonded interfaces were systematically investigated. Experimental results indicated that GaAs did not bond directly to itself, but via an amorphous oxide layer at 400 °C. When temperatures increased above 400 °C, the oxide bonded area declined and finally disappeared. Electrical resistance decreased with bonding temperature. However, the resistance increased with temperatures exceeding 850 °C. © 2004 American Institute of Physics.

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