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Effects of ultraviolet treatment on the contact resistivity and electronic transport at the Ti/ZnO interfaces
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Effects of ultraviolet treatment on the contact resistivity and electronic transport at the Ti/ZnO interfaces

Yow-Jon Lin, Chia-Lung Tsai, W.-R. Liu, W.F. Hsieh, C.-H. Hsu, Hou-Yen Tsao, Jian-An ChuHsing-Cheng Chang
Journal of Applied Physics, 卷.106(1), 013701
2009

摘要

Physics and Astronomy (all)
We report on the effect of ultraviolet (UV) treatment on the specific contact resistance (ρ) and electronic transport at the Ti/ZnO interfaces. The experimental results show the same barrier height of Ti/ZnO samples without UV treatment as Ti/ZnO samples with UV treatment and the higher ρ of Ti/ZnO samples with UV treatment than Ti/ZnO samples without UV treatment, suggesting the barrier-height independence of ρ. Based on the thermionic-emission model and x-ray photoelectron spectroscopy results, we found that the induced decrease in the number of the hydroxides at the surface region of ZnO by UV treatment resulted in decreases in the electron concentration near the surface region and the excess current component related to tunneling, increasing in ρ of Ti/ZnO samples. © 2009 American Institute of Physics.

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