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Efficient low-temperature data retention lifetime prediction for split-gate flash memories using a voltage acceleration methodology
Journal article   Peer reviewed

Efficient low-temperature data retention lifetime prediction for split-gate flash memories using a voltage acceleration methodology

Ling-Chang Hu, An-Chi Kang, Tai-Yi Wu, J.R. Shih, Yao-Feng Lin, Kenneth Wu and Ya-Chin King
IEEE Transactions on Device and Materials Reliability, Vol.6(4), pp.528-533
12/2006

Abstract

Low-temperature data retention (LTDR) Program/erase (P/E) cycling Reliability Split-gate Flash memory Stress-induced leakage current (SILC) Voltage-acceleration lifetime model
In developing a fast statistical testing methodology to predict the postcycling low-temperature data-retention lifetime of split-gate Flash memories, word-line stress is used to accelerate the charge-gain effect responsible for bit-cell-current reduction among the tail-bits. To find out the voltage dependence on data-retention lifetime, various word-line stress voltages are performed to enhance the charge-gain effect of the erase-state cells. At an accelerated state, word-line stress lifetime tests can be completed within a much shorter test period and still provide accurate lifetime prediction for embedded Flash-memory products. © 2006 IEEE.

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