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Electromagnetic characteristic estimation on spiral antennas through AOI, ML, and AI
期刊文章

Electromagnetic characteristic estimation on spiral antennas through AOI, ML, and AI

Meng-Jhu Wu, Min-Chi Chang, Chin-Chien Chung, Padmanabh Pundrikaksha Pancham, Ta-Jen YenCheng-Yao Lo
Flexible and Printed Electronics, 卷.7(2), 025012
06/2022

摘要

antenna line edge roughness machine learning printed electronics Electronic Optical and Magnetic Materials Electrical and Electronic Engineering
In this study, a method that is able to estimate the electromagnetic characteristic of spiral antennas was proposed and realized through consecutive procedures of automatic optical inspection (AOI), machine learning (ML), and artificial intelligence (AI), providing a solution to smart manufacturing. Two-arm self-complementary Archimedean spiral antennas (SCASAs) were introduced as examination targets with pattern distortions from potential process variations, in which bulges and neckings were mathematically generated to imitate uncontrollable ink rheology in printed and flexible electronics, covering the unexplored parts in previous works. The SCASAs in the training group were fabricated by standard printed circuit board procedures, and their pattern integrity in terms of line edge roughness (LER) and coupling frequency were collected through AOI for ML as the feature and label, respectively. The established AI model was based on Gaussian process regression with covariance function of exponential that showed the smallest root-mean-square-error and the largest coefficient of determination through iterative lazy-learning. By feeding the LERs of the SCASAs into the testing group, their corresponding coupling frequencies were estimated by the established AI model with high confidence level. Good linearity between the estimated and measured responses indicated that a reliable AI model and procedure were built, which outperforms existing methods that are unable to project off-line active characteristics of microelectronic components from their in-line pattern integrities.

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