摘要
As a wide bandgap and single crystalline semiconductor, 4H-polytype silicon carbide (4H-SiC) is an excellent material choice for devices operating in harsh environments of high temperature, high pressure, radiation, chemical and biomedical, etc. In this letter, an electrostatically actuated 4H-SiC microresonator was fabricated by dopant-selective photoelectrochemical etching of n-p-n homoepitaxial structure. Resonant frequencies of 3.463 MHz (out-of-plane) and 16.9 MHz (in-plane) were attained and they are in good agreement with theoretical calculation. To the best of our knowledge, these frequencies are the highest values ever reported from single crystalline 4H-SiC MEMS resonators.