Erratum: Real-time feedback control of electron density in inductively coupled plasmas (Journal of Vaccum Science and Technology A (2001) 19 (750))

Journal article

Peer reviewed

C.-H. Chang, K.-C. Leou and C. Lin

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Vol.19(5), p.2709

09/2001

Abstract

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Title: Erratum: Real-time feedback control of electron density in inductively coupled plasmas (Journal of Vaccum Science and Technology A (2001) 19 (750))
Creators - without role: C.-H. Chang - National Tsing Hua University
K.-C. Leou - National Tsing Hua University
C. Lin - National Tsing Hua University
Publication Details: Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Vol.19(5), p.2709
Identifiers: 9957774126206774
Academic Unit: College of Electrical Engineering and Computer Science, National Tsing Hua University; Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: English
Resource Type: Journal article