- Title
- Existence of optimal N2O nitridation temperature and time for hot-electron hardness enhancement in metal-oxide-Si capacitors
- Creators - without role
- Kuei-Shu Chang-Liao - Dept. of Eng. and System Science , National Tsing Hua UniversityHan-Chao Lai - National Tsing Hua University
- Publication Details
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol.16(1), pp.250-252
- Identifiers
- 9957769207606774
- Academic Unit
- Institute of Nuclear Engineering and Science, College of Nuclear Science, National Tsing Hua University
- Language
- English
- Resource Type
- Journal article
Journal article
Existence of optimal N2O nitridation temperature and time for hot-electron hardness enhancement in metal-oxide-Si capacitors
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol.16(1), pp.250-252
01/1998
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