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Experimental verification of electrostatic boundary conditions in gate-patterned quantum devices
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Experimental verification of electrostatic boundary conditions in gate-patterned quantum devices

H. Hou, Y. Chung, G. Rughoobur, T.K. Hsiao, A. Nasir, A.J. Flewitt, J.P. Griffiths, I. Farrer, D.A. RitchieC.J.B. Ford
Journal of Physics D: Applied Physics, 卷.51(24), 244004
05/2018

摘要

boundary condition patterned quantum device surface acoustic wave Electronic Optical and Magnetic Materials Condensed Matter Physics Acoustics and Ultrasonics Surfaces Coatings and Films
In a model of a gate-patterned quantum device, it is important to choose the correct electrostatic boundary conditions (BCs) in order to match experiment. In this study, we model gated-patterned devices in doped and undoped GaAs heterostructures for a variety of BCs. The best match is obtained for an unconstrained surface between the gates, with a dielectric region above it and a frozen layer of surface charge, together with a very deep back boundary. Experimentally, we find a ∼0.2 V offset in pinch-off characteristics of 1D channels in a doped heterostructure before and after etching off a ZnO overlayer, as predicted by the model. Also, we observe a clear quantised current driven by a surface acoustic wave through a lateral induced n-i-n junction in an undoped heterostructure. In the model, the ability to pump electrons in this type of device is highly sensitive to the back BC. Using the improved boundary conditions, it is straightforward to model quantum devices quite accurately using standard software.

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