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Fabrication and characterization of 650 nm resonant-cavity light-emitting diodes
Journal article   Peer reviewed

Fabrication and characterization of 650 nm resonant-cavity light-emitting diodes

Chia-Lung Tsai, Chih-Wei Ho, Chun-Yuan Huang, Feng-Ming Lee, Meng-Chyi Wu, Hai-Lin Wang, Sum-Chien Ko, Wen-Jeng Ho, Jet Huang and J.R. Deng
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol.22(5), pp.2518-2521
09/2004

Abstract

The fabrication and characterization of 650 nm AlGaInP resonant-cavity light-emitting diodes (RCLEDs) was studied. For the experiment, the AlGaInP epitaxial structures were grown on Si-doped n-type GaAs substrates. Photolithography, metallization, and bonding techniques were used to fabricate the devices with surface emitting geometry. All the devices were found to exhibit a low operating voltage ranging from 1.9 to 2.0 v at 20 mA which was attributed to carbon doping. The RCLED with a window diameter of 120 μm exhibited the maximum light output power of 0.79mw at 39 mA.

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