摘要
We describe a procedure for rapidly and conveniently prototyping a periodic structure at submicrometer order using holographic interferometry and micro-molding processes. In this experiment, the master of the periodic structure was created on an i-line submicrometer positive photoresist film by a holographic interference using a He-Cd (325nm) laser. A subsequent mold using polydimethylsiloxane (PDMS) polymer was cast against this master and used as a stamp to transfer the grating pattern onto a U V cure epoxy. The technique shows accurate control for the transferring of a grating's period and depth. The grating pattern on the epoxy produced by the PDMS mold shows an average of less than 2% error in the grating period and an average of 15% error in depth reproduction. © 2005 Optical Society of America.