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Fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell application
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Fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell application

Kartika Chandra Sahoo, Men-Ku Lin, Edward-Yi Chang, Yi-Yao Lu, Chun-Chi Chen, Jin-Hua Huang 和 Chun-Wei Chang
Nanoscale Research Letters, 卷.4(7), 頁碼.680-683
07/2009
DOI: https://doi.org/10.1007/s11671-009-9297-7

摘要

Anti-reflective coatings Reflectance Solar cell Sub-wavelength Structure SWS fabrication Materials Science (all) Condensed Matter Physics
We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.

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