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Fabrication of double-length-scale patterns via lithography, block copolymer templating, and electrodeposition
Journal article   Peer reviewed

Fabrication of double-length-scale patterns via lithography, block copolymer templating, and electrodeposition

Yu-Tsan Tseng, Wen-Hsien Tseng, Cheng-Hsuan Lin and Rong-Ming Ho
Advanced Materials, Vol.19(21), pp.3584-3588
05/11/2007

Abstract

Fabrication of double-length-scale patterns via lithography, block copolymer templating, and electrodeposition is demonstrated. The formation of the composite patterns relied upon polymer templating from the self-assembly of PS-LLA on prepatterned conducting substrates, followed by the electroplating deposition of Ni. The two-electrode field-emission device for patterned Carbon nanotubes grown from PS-Ni composite films on micropatterned ITO glass was manufactured. Electrodeposition of Ni was done in the nanopores to create a specific size and array density of catalytic patterns for the growth of carbon nanotubes. EDS process was used to verify the presence of Ni and the peaks were observed at 0.851 and 7.472 keV. The results show that the CNTs with double length-scale-pattern arrays begin to emit at a low field of 2 V μm.

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