Abstract
We report the fabrication of metallic nanostructures by atomic force microscopy nanomachining on a thin resist and subsequent metal coating and lift-off. Nanodots with a size of 70 nm, nanowires with a width of 120 nm, and nanoelectrodes with a gap of 50 nm have been successfully created. Theoretical estimates of the minimum force for a satisfactory lift-off are also given and found to be consistent with the experimental value. The present work demonstrates the feasibility and effectiveness of using a single-layer resist in comparison with a two-layer resist. © 2004 American Vacuum Society.