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Fabrication of nickel oxide nanostructures by atomic force microscope nano-oxidation and wet etching
Journal article   Peer reviewed

Fabrication of nickel oxide nanostructures by atomic force microscope nano-oxidation and wet etching

Ju-Hung Hsu, Hsin-Wen Lai, Heh-Nan Lin, Chia-Chih Chuang and Jin-Hua Huang
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol.21(6), pp.2599-2601
11/2003

Abstract

The fabrication of nickel oxide nanostructures by atomic force microscope nano-oxidation and subsequent wet etching was discussed. The nickel oxide patterns were first created by the process of nano-oxidation by applying a negative bias to a conductive tip. The complete removal of the nickel film and the preservation of the oxide patterns were confirmed by Auger electron spectroscopy. The results show that nickel oxide nanodots with diameters as small as 100 nm are reliably produced by this method.

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