Abstract
We applied the laser interference lithography method to form a patterned sapphire substrate (PSS). A three-dimensional photonic crystal was formed by autocloning the PSS with alternate Ta2O5/SiO2 coatings. A high total integrated reflectance (TIR) band was obtained around the 410 to 470nm wavelength range that matched the emission spectrum of the gallium nitride (GaN) light-emitting diode (LED) for\ application in manipulating the light extraction of the sapphire-based GaN LED. © 2010 Optical Society of America.