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First-principles analysis of interfacial nanoscaled oxide layers of bonded N - And P -type GaAs wafers
Journal article   Open access   Peer reviewed

First-principles analysis of interfacial nanoscaled oxide layers of bonded N - And P -type GaAs wafers

Hao Ouyang, Hsiao-Hao Chiou, Yewchung Sermon Wu, Ji-Hao Cheng and Wen Ouyang
Journal of Applied Physics, Vol.102(1), 013710
2007

Abstract

First-principles analysis is applied in relating microstructures with properties of interfacial nanoscaled oxide layers of bonded N - and P -type GaAs wafers. Using high-resolution transmission electron microscope results, the detailed atomic arrangements of materials specimen can be obtained and fed into the first-principles calculations. Therefore, the corresponding electronic structure and associated property can be reliably derived to identify responsible microstructural features. The electrical performance is found to be closely related to the variation of nanosized interface morphology and types of wafers. © 2007 American Institute of Physics.
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https://doi.org/10.1063/1.2748335View
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