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Full-field hard x-ray microscopy below 30 nm: A challenging nanofabrication achievement
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Full-field hard x-ray microscopy below 30 nm: A challenging nanofabrication achievement

Yu-Tung Chen, Tsung-Nan Lo, Yong S. Chu, Jaemock Yi, Chi-Jen Liu, Jun-Yue Wang, Cheng-Liang Wang, Chen-Wei Chiu, Tzu-En Hua, Yeukuang Hwu, …
Nanotechnology, 卷.19(39), 395302
10/2008

摘要

Bioengineering Chemistry (all) Materials Science (all) Mechanics of Materials Mechanical Engineering Electrical and Electronic Engineering
The fabrication of devices to focus hard x-rays is one of the most difficult - and important - challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels. © IOP Publishing Ltd.

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