Functionalizing Self-Assembled Monolayers to Reduce Interface Scattering in Ruthenium/Dielectric for Next-Generation Microelectronic Interconnects

期刊文章

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Bin-Fu Hsu, Jia-You Sun, Yu-Lin Chen, Ming-Yen Lu, 守一張和 Pei Yuin Keng

Applied Surface Science, 卷.645

01/02/2024

摘要

Self-assembled monolayer;interface scattering;interconnect;FS-MS model;interface dipole;adhesion strength

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題名: Functionalizing Self-Assembled Monolayers to Reduce Interface Scattering in Ruthenium/Dielectric for Next-Generation Microelectronic Interconnects
創作者：: Bin-Fu Hsu (作者) - National Tsing Hua University
Jia-You Sun (作者) - National Tsing Hua University
Yu-Lin Chen (作者) - National Tsing Hua University
Ming-Yen Lu (作者)
守一張 (作者)
Pei Yuin Keng (作者) - National Tsing Hua University
學術資源類型: 期刊文章
出版日期: 01/02/2024
出版資訊: Applied Surface Science, 卷.645
語言: 英語