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Gate length scaling effect on high-electron mobility transistors devices using AlGaN/GaN and AlInN/AlN/GaN heterostructures
Journal article   Peer reviewed

Gate length scaling effect on high-electron mobility transistors devices using AlGaN/GaN and AlInN/AlN/GaN heterostructures

S.Y. Liao, C.C. Lu, T. Chang, C.F. Huang, C.H. Cheng and L.B. Chang
Journal of Nanoscience and Nanotechnology, Vol.14(8), pp.6243-6246
2014

Abstract

2DEG AlInN/AlN/GaN High-electron mobility transistors (HEMTs)
Compared to AlGaN/GaN HEMT with 0.15 μm T-gate length, the AlInN/AlN/GaN one exhibits much higher current density and transconductance of 1558 mA/mm at V d = 2 V and 330 mS/mm, respectively. The high extrinsic f t and f max of 82 GHz and 70 GHz are extracted from AlInN/AlN/GaN HEMT. Besides, we find that the transconductance roll-off is significant in AlGaN/GaN, but largely improved in AlInN/AlN/GaN HEMT, suggesting that the high carrier density and lattice-matched epitaxial heterostructure is important to reach both large RF output power and high operation frequency, especially for an aggressively gate length scaling. Copyright © 2014 American Scientific Publishers.

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