Logo image
Growth and characterization of CeO2 films on sapphire substrates by sputtering process
Journal article   Peer reviewed

Growth and characterization of CeO2 films on sapphire substrates by sputtering process

Ran-Jin Lin, Lih-Juann Chen, Lih-Jiaun Lin, Yueh-Chung Yu, Chang-Wan Wang and Erh-Kang Lin
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol.35(11), pp.5805-5810
11/1996

Abstract

CeO2 Films Sapphire substrate Sputtering Superconductor YBCO
Two-inch-diameter CeO 2 films on R-plane (1102) sapphire substrates have been prepared using an on-axis rf magnetron sputtering method. The effects of postannealing treatment, sputtering gas pressure and substrate temperature on the orientation, crystallinity and surface morphology of the CeO 2 films have been investigated. The (100)-preferred CeO 2 films with high crystallinity are grown at 820°C and 0.15 Torr and have a full width at half-maximum value of the rocking curve of (200) planes of 0.15°. The spatial variation of thickness of the CeO 2 films across the 2-inch substrate is about 5.8%. The c-axis oriented YBa 2 Cu 3 O x (YBCO) films grown on sapphire substrates with a (100)-preferred CeO 2 buffer layer of 100 nm are made. The YBCO films have superconducting properties with the T c being 88-90 K and J c (77 K, 0 T) being (1-3) × 10 6 A/cm 2 .

Metrics

1 Record Views

Details

Logo image