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Growth of BiFeO3/SrTiO3 artificial superlattice structure by RF sputtering
Journal article   Peer reviewed

Growth of BiFeO3/SrTiO3 artificial superlattice structure by RF sputtering

Shang-Jui Chiu, Yen-Ting Liu, Hsin-Yi Lee, Ge-Ping Yu and Jia-Hong Huang
Journal of Crystal Growth, Vol.334(1), pp.90-95
01/11/2011

Abstract

A1. X-ray diffraction A3. RF sputtering A3. Thin film/epitaxial growth B2. Ferroelectric materials
Asymmetric superlattice structures consisting of multiferroic BiFeO 3 (BFO) and paraelectric SrTiO 3 (STO) sublayers were grown on a Nb-doped STO substrate by RF magnetron sputtering at temperatures in the range 500800 °C. For substrate temperatures less than 500 °C and at 800 °C, only poorly crystalline films resulted, whereas a BFO/STO superlattice structure film of great crystalline quality was obtained for a substrate temperature in the range 550750 °C. The formation of a superlattice structure was confirmed through both the appearance of Bragg lines separated by Kiessig fringes in X-ray reflectivity curves and the satellite features of a (002) diffraction pattern. The clearly discernible main and satellite features on both sides of the substrate about the (002) STO Bragg peak of superlattice films indicate the high quality of the BFO/STO artificial superlattice structure. For BFO/STO superlattice films deposited at 600700 °C, the increased crystalline quality with smaller interface roughness correlates with larger lattice strain and remanent polarization of the film. The lattice strain and interface quality might be important factors that influence the leakage and ferroelectric properties in BFO/STO artificial superlattices. © 2011 Elsevier B.V. All rights reserved.

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