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Growth of GaAs/Ca0.45Sr0.55F2/GaAs structures by molecular beam epitaxy
Journal article   Peer reviewed

Growth of GaAs/Ca0.45Sr0.55F2/GaAs structures by molecular beam epitaxy

S. Horng, A. Kahn, C. Wrenn and R. Pfeffer
Materials Science and Engineering B, Vol.9(1-3), pp.263-267
15/07/1991

Abstract

Lattice-matched GaAs/Ca 0.45 Sr 0.55 F 2 /GaAs structures are grown by molecular beam epitaxy on GaAs(100) substrates. The surface morphology and crystallinity of each layer are studied as a function of growth temperature. The best fluoride layers are grown with a substrate temperature of about 530°C and show excellent crystallinity (χ min = 7% in ion channeling). The best GaAs layers are obtained around 600°C and show medium bulk crystallinity (χ min = 30%). Electron beam irradiation of the fluoride surface considerably improves the GaAs surface morphology. © 1991.

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