Abstract
The synthesis of RuO <sub>2</sub> nanorods with reactive sputtering was demonstrated in this work. The synthesis process is very much like the metal organic chemical vapor deposition, except that RuO <sub>3</sub> generated with reactive sputtering under high oxygen-to-argon flow ratio (>5 SCCM/15 SCCM) (SCCM denotes cubic centimeter per minute at STP) and high substrate temperature (>300 °C) is used in place of the metal organic precursor. RuO <sub>2</sub> nanorods tend to grow steadily with constant aspect ratio (∼27) and the field-emission characteristics appear very sensitive to their spatial distribution. © 2006 American Institute of Physics.