Abstract
This study demonstrates platinum (Pt) counter electrodes with low charge-transfer resistance (R ct ), low Pt loading and high active surface area can be obtained within 30 s by using the direct-current deposition in the presence of 3-(2-aminoethylamino)propyl-methyldimethoxysilane (Me-EDA-Si) as an additive. The addition of appropriate Me-EDA-Si can not only enhance the current efficiency but also inhibit the growth of semicircle-like grains, thus resulting in Pt electrode with high active surface area. Consequently, the dye-sensitized solar cells (DSSCs) fabricated with so-prepared Pt electrodes exhibited cell efficiency of 7.39% while 0.01 vol% Me-EDA-Si was added, which is much superior to that with sputtered-Pt electrodes under the same assembly conditions. © 2010 Elsevier Ltd.