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High-speed InGaAsSb/InP double heterojunction bipolar transistor with composition graded base and InAs emitter contact layers
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High-speed InGaAsSb/InP double heterojunction bipolar transistor with composition graded base and InAs emitter contact layers

Bing-Ruey Wu, William Snodgrass, Milton FengKEH-YUNG CHENG
Journal of Crystal Growth, 卷.301-302(SPEC. ISS.), 頁碼.1005-1008
04/2007

摘要

A3. Molecular beam epitaxy B2. Semiconducting indium phosphide B3. Bipolar transistors B3. Heterojunction semiconductor devices
InAs-InGaAs graded emitter contact layer was incorporated into the InGaAsSb-GaAsSb/InP graded base double heterojunction bipolar transistors (DHBTs). Compared to a uniform In 0.53 Ga 0.47 As emitter contact layer, the graded InAs-InGaAs emitter contact layer effectively reduced specific contact resistance from 0.378 to 0.091 Ω-μm 2 . Measured sheet resistance also decreased from 58.3 to 47.4 Ω/□. A graded base DHBT with a 0.5×8 μm 2 emitter showed a unity current gain cutoff frequency (f T ) and maximum oscillation frequency (f MAX ) of 500 GHz and 260 GHz, respectively. The f MAX improves to 350 GHz when a smaller (0.4×3 μm 2 ) emitter is utilized. © 2006 Elsevier B.V. All rights reserved.

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