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High-temperature and high-frequency operation of 1.3 μm AlGaInAsInP laser diodes using silicon oxide planarization
Journal article   Peer reviewed

High-temperature and high-frequency operation of 1.3 μm AlGaInAsInP laser diodes using silicon oxide planarization

Te-Chin Peng, Chih-Chao Yang, Yun-Hsun Huang and Meng-Chyi Wu
Journal of the Electrochemical Society, Vol.154(5), pp.H380-H383
2007

Abstract

Electrochemistry,Surfaces Coatings and Films,Surfaces and Interfaces
In this article, a self-terminated oxide polish (STOP) planarization technique is utilized to fabricate high-temperature and high-speed 1.3 μm AlGaInAsInP ridge-waveguide laser diodes (LDs). The as-cleaved LDs fabricated by this STOP technique exhibit a threshold current of 8.5 and 57.5 mA, and a light output power of 27 and 2.4 mW at 100 mA for 0 and 130°C, respectively. The characteristic temperature (T0) is 85.5 K from 0 to 80°C and 54.1 K from 80 to 130°C. The full width at half maximum of the lateral far-field angle is 34° for the conventional ridge LDs and reduces to 22° for the LDs by the STOP technique. The 3 dB modulation bandwidth at 100 mA of the LDs can reach 16.9 at 20°C and 10.9 GHz at 90°C. © 2007 The Electrochemical Society.

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