Hydrodynamic investigation of a wafer rinse process through numerical modeling and flow visualization methods

期刊文章

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Chia Yuan Chen, Bivas Panigrahi, Kok Shen Chong, Wei Hsien Li, Yi Li Liu 和 Tsung Yi Lu

Journal of fluids engineering, 卷.140(8), 頁碼.081106/1-081106/8

01/08/2018

Web of Science ID: WOS:000439927200006

摘要

Computation fluid dynamics

Lifters

Particle image velocimetry

Vortex

Wafer rinsing tank

1 檢視次數

題名: Hydrodynamic investigation of a wafer rinse process through numerical modeling and flow visualization methods
創作者：: Chia Yuan Chen - National Cheng Kung University
Bivas Panigrahi - National Cheng Kung University
Kok Shen Chong - Taiwan Semiconductor Manufacturing Company (Taiwan)
Wei Hsien Li - Fab-14 Diffusion Engineering Department 1, Taiwan Semiconductor Manufacturing Company (TSMC), Tainan, Taiwan
Yi Li Liu - Taiwan Semiconductor Manufacturing Company (Taiwan)
Tsung Yi Lu - National Cheng Kung University
補助款備註: MOST 105-2628-E-006-006-MY3 / Ministry of Science and Technology, Taiwan (501100004663) MOST 105-2628-E-006-006-MY3; 105-2628-E-006-006-MY3 / Ministry of Science and Technology, Taiwan (http://data.elsevier.com/vocabulary/SciValFunders/501100004663)
學術資源類型: 期刊文章
出版日期: 01/08/2018
出版資訊: Journal of fluids engineering, 卷.140(8), 頁碼.081106/1-081106/8
語言: 英語