摘要
Defect pattern detection and classification are challenging for thin-film-transistor liquid-crystal display (TFT-LCD) manufacturing. Limitations of the existing solutions for automatic optical inspection can be traced in part to the lack of a framework within which different existing and new defect patterns can be analyzed, while integrating domain knowledge and effective technologies. This study aims to develop a framework for image-based defect classification that employs the convolution neural networks without using complex and time-consuming image-processing processes in advance. An empirical study was conducted in a leading TFT-LCD manufacturing in Taiwan for validation. The results have shown that the defect patterns can be effectively classified by the proposed convolutional neural networks that outperform the existing approaches such as Support Vector Machine and Random Forest. The developed solution is implemented to effectively support the engineers.