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In-Situ Growth of Superconducting Oxide Films by Hot - Wall Sputtering Method
Journal article

In-Situ Growth of Superconducting Oxide Films by Hot - Wall Sputtering Method

R. J. Lin and L. J. Chen
Chinese Journal of Physics Chinese Journal of Physics, Vol.31(6s), pp.1097-1102
1993

Abstract

A simple, economic hot-wall DC sputtering system, which a deposition chamber was made of a quartz tube and heated by a tube-furnace was used to grow as-deposited superconducting YBaCuO films on (001) MgO, (001) YSZ, (001) LaAlO3, and (1212) Al2O3 (with YSZ buffer layer) and BiSrCaCuO films on (001) MgO substrates. The films have strongly c-axis preferred orientation. The typical superconducting properties of the YBaCuO and BiSrCaCuO films are TC (R = 0) of 90 K, Jc of 3 x 10^6 A/cm^2 at 77 K and Tc (R = 0) of 79 K, Jc of 2 x 10^4 A/cm^2 at 4.2 K, respectively.

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