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In situ growth of superconducting YBa2Cu3O 7-x thin films by a hot-wall sputtering process
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In situ growth of superconducting YBa2Cu3O 7-x thin films by a hot-wall sputtering process

R.J. Lin and L.J. Chen
Applied Physics Letters, Vol.62(1), pp.105-107
1993

Abstract

YBa 2 Cu 3 O 7-x (YBCO) superconducting thin films with T c of 89 K and J c of 2.7×10 6 A/cm 2 at 77 K, zero field were prepared by a modified high pressure (1.5 Torr) dc planar diode sputtering process. The design and construction of the simple, economic hot-wall sputtering system which has been achieved in growing high-quality YBCO films on (001)MgO, (001)LaAlO 3 , and (001)YSZ substrates are reported.

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