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Induced NH 2 bonding of carbon nanotubes using NH 3 plasma-enhanced chemical vapor deposition
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Induced NH 2 bonding of carbon nanotubes using NH 3 plasma-enhanced chemical vapor deposition

Ai-Huei Chiou, Yu-Ming Chang, Wen-Fa Wu, Chang-Ping ChouChun-Yao Hsu
Journal of Materials Science: Materials in Electronics, 卷.23(4), 頁碼.889-896
04/2012

摘要

Electronic Optical and Magnetic Materials Atomic and Molecular Physics and Optics Condensed Matter Physics Electrical and Electronic Engineering
Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH 3 ) plasma. For various durations of NH 3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH 3 plasma treatment can incorporate amine (NH 2 -) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic. © Springer Science+Business Media, LLC 2011.

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