摘要
AlGaN/GaN single heterojunction bipolar transistors (SHBTs) without using regrown emitter junction are demonstrated. Secondary ion mass spectroscopy analysis shows that a severe codiffusion of Al and Si exists in AlGaN/GaN heterostructures grown at 780 °C. The altered composition and doping profiles greatly degrade the common-emitter current gain of AlGaN/GaN HBTs to ≤0.8. A GaN spacer layer is inserted at the emitter-base junction to alleviate this problem. In an AlGaN/GaN HBT structure inserted with a 20 nm unintentionally doped GaN spacer layer, a current gain β about 2 is achieved.