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Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering
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Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering

A.H. Chiou, C.G. Kuo, C.H. Huang, W.F. Wu, C.P. ChouC.Y. Hsu
Journal of Materials Science: Materials in Electronics, 卷.23(2), 頁碼.589-594
02/2012

摘要

Electronic Optical and Magnetic Materials Atomic and Molecular Physics and Optics Condensed Matter Physics Electrical and Electronic Engineering
Titanium dioxide (TiO 2 ) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron sputtering using a TiO 2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 °C and total gas pressure of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic activities of the TiO 2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO 2 thin films. The results showed that when the [O 2 /(Ar + O 2 )] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water contact angle after 9 min UV illumination was approximately 4.5°, and the methylene blue (MB) solution decomposition from 12 down to 3.34 μ mol/L for 240 min UV irradiation. © 2011 Springer Science+Business Media, LLC.

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