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Influence of the thickness of silica layer on the radiative relaxation of AuNR@SiO2 core–shell nanostructures upon photoexcitation
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Influence of the thickness of silica layer on the radiative relaxation of AuNR@SiO2 core–shell nanostructures upon photoexcitation

Jhih-Jie Lai, Meng-Chen ShihLi-Kang Chu
Journal of the Chinese Chemical Society, 卷.69(73)
2021

摘要

infrared emission;photothermal effect;silica-coated gold nanorod;step-scan FTIR Chemistry (all)

Silica-coated gold nanorods with different silica thicknesses (AuNR@X-SiO 2 , X = 20, 35, 50 and 65, denoting the SiO 2 thickness in nm on the longitudinal side) were excited with a 7-ns pulsed 1064-nm laser. The infrared emissions of AuNR@X-SiO 2 , probed with a step-scan Fourier-transform interferometer, enveloped the optical phonon modes of the Si-O-Si bridge (1250–1000 cm −1 ) and adsorbed water (1700–1550 cm −1 ) within silica pores and minute blackbody radiation, indicating the capability of populating the optical phonon energy of capping layers in core-shelled nanostructures upon photoexcitation. The decay of the emission at 1250–1000 cm −1 was decelerated as the thickness of silica increased. The kinetic analysis on the emission evolutions provided the thermalization properties of SiO 2 on a microsecond timescale, including the intrinsic spontaneous radiation and the non-radiative thermal conduction. The vibrational energy stored in the solid SiO 2 and the embedded water might be capable of serving as an energy donor, that is, an optically-energized catalyst, for vibrationally-assisted chemical reactions.

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