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Interfacial magnetic coupling in Co/antiferromagnetic van der Waals compound FePS3
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Interfacial magnetic coupling in Co/antiferromagnetic van der Waals compound FePS3

Alltrin Dhanarajgopal, Po-Chun Chang, Shi-Yu Liu, Tzu-Hung Chuang, Der-Hsin Wei, Chien-Cheng Kuo, Chia-Nung Kuo, Chin Shan LueWen-Chin Lin
Applied Surface Science, 卷.567, 150864
11/2021

摘要

Magnetism Perovskite Thin film Chemistry (all) Condensed Matter Physics Physics and Astronomy (all) Surfaces and Interfaces Surfaces Coatings and Films
In this study, a Co-thin film was deposited on the van der Waals compound of FePS 3 for the investigation of interfacial magnetic coupling, which is crucial to the application in spintronic devices. As characterized by atomic force microscopy, the exfoliated FePS 3 surface was composed of defects within ±1 monolayer height. The Co thin film covered the FePS 3 substrate uniformly with a roughness within ±0.5 nm. The 2 nm-Pd/7 nm-Co/FePS 3 exhibited isotropic magnetism in the surface plane and the magnetic coercivity drastically decreased by more than 50% when the temperature was elevated from 85 K to 110–120 K, which is nearly the Néel temperature of FePS 3 . This observation indicates the interfacial magnetic coupling between Co and FePS 3 . The Co/FePS 3 magnetic coupling is robust even after annealing up to 200 °C. Furthermore, the measurement of X-ray magnetic circular dichroism confirmed the presence of non-compensated Fe moment along the in-plane direction is parallel to the Co magnetization direction. The net Fe-moment is supposed to play an essential role in mediating the magnetic coupling between the in-plane ferromagnetic Co and the perpendicular antiferromagnetic FePS 3 .

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