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Interfacial reaction and microstructural evolution for electroplated Ni and electroless Ni in the under bump metallurgy with 42Sn58Bi solder during annealing
Journal article   Peer reviewed

Interfacial reaction and microstructural evolution for electroplated Ni and electroless Ni in the under bump metallurgy with 42Sn58Bi solder during annealing

B.-L. Young and J.-G. Duh
Journal of Electronic Materials, Vol.30(7), pp.878-884
07/2001

Abstract

Interfacial microstructure Intermetallic compound Sn-Bi solder UBM
In the present study, several under bump metallization (UBM) schemes using either electroplated Ni or electroless Ni (EN) as the solderable layer are investigated. The EN and electroplated Ni are first deposited on Cu/Al 2 O 3 substrates, followed by electroplating of thin gold coatings. Joints of 42Sn-58Bi/AuEN/Cu/Al 2 O 3 and 42Sn-58Bi/Au/Ni/Cu/Al 2 O 3 are annealed at 145°C and 185°C for 30-180 minutes to investigate the interfacial reaction between the solder and metallized substrates. For 42Sn-58Bi/Au/Ni-5.5wt.%P/Cu/Al 2 O 3 , 42Sn-58Bi/Au/Ni-12.1wt.%P/Cu/Al 2 O 3 , and 42Sn-58Bi/Au/Ni/CU/Al 2 O 3 joints annealed at 145°C, only Ni 3 Sn 4 intermetallic compound (IMC) formed at the solder/EN interface. When annealed at an elevated temperature of 185°C, plate-like Ni 3 Sn 4 IMC forms at the solder/Ni-5.5wt.%P interface, while a trace of (Ni, Cu) 3 Sn 4 IMC is observed at the solder/Ni-12.1wt.%P interface and within the solder region. For the electroplated Ni-based multi-metallization substrate, the Ni 3 Sn 4 IMC is present at the solder/Ni interface during annealing at 185°C for a short period of time. In the 42Sn-58Bi/Au/EN/Cu/Al 2 O 3 joint, the EN spalls off the EN layer and migrates into the solder region when annealed at 185°C. The interface of the solder/electroplating Ni becomes saw-toothed as the annealing temperature is raised to 185°C. In addition, an enrichment of phosphorus is observed at the interface of the Ni-Sn IMC and EN.

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