摘要
The organic-inorganic multilayer thin film composed of SiO x (nonstoichiometric silicon suboxides) and PI (polyimide) has been synthesized by a hybrid sputtering system combining reactive RF sputtering and pulsed laser deposition. SiO x /PI thin films were deposited on a copper foil to investigate its electrochemical properties. The chemical composition of as-deposited SiO x /PI coatings was measured by a FE-EPMA. The overall multilayered structure was observed by a Scanning Electron Microscopy. The SiO x /PI multilayer thin film anode with proper architecture control exhibits higher columbic efficiency during 1st charge/discharge cycle and better capacity retention as compared to pure SiO x thin film anode. The fracture toughness of SiO x /PI multilayer thin film anode is measured via nanoindentation and be compared to the pure SiO x thin film anode. The results show that the multilayer structure reveals a higher fracture toughness, which leads to a better structure stability during the charge/discharge cycling.