摘要
The technique of laser-assisted nanoimprinting lithography (LAN) has been proposed to utilize an excimer laser to irradiate through a quartz mold and melts a thin polymer film on the substrate for micro- to nano-scaled fabrications. This study introduces optical multiple reflection theory to demonstrate both analytical and numerical modeling during the LAN process and to predict the thermal response theoretically. Furthermore, the capability of energy absorption for polymer resist is examined herein. The temperature of polymer resist with the capability of energy absorption is much higher than that without energy absorption. This study demonstrates the characteristics of the energy absorption for polymer materials could improve the performance of the LAN process for the reason that the thermally affected region is extremely limited.