Abstract
Charge-pumping (CP) techniques with various rise and fall times and with various voltage swings are used to investigate the energy distribution of interface-trap density and the bulk traps. The charge pumped per cycle (Q cp ) as a function of frequency was applied to detect the spatial profile of border traps near the high-k gate dielectric/Si interface and to observe the phenomena of trap migration in the high-k dielectric bulk during constant voltage stress (CVS) sequence. Combining these two techniques, a novel CP technique, which takes into consideration the carrier tunneling, is developed to measure the energy and depth profiles of the border trap in the high-k bulk of MOS devices. © 2007 Elsevier B.V. All rights reserved.