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Investigation on the phosphorous interstitials in phosphorus-implanted copper indium disulfide by a simplified total energy calculation
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Investigation on the phosphorous interstitials in phosphorus-implanted copper indium disulfide by a simplified total energy calculation

Y.J. Hsu and H.L. Hwang
Journal of Applied Physics, Vol.66(4), pp.1651-1653
1989

Abstract

Physics and Astronomy (all)
This paper presents a simplified total energy calculation for the phosphorus interstitials in P + -implanted CuInS 2 . The calculation was based on the tight-binding approximation and the atomic structure calculation scheme. Two types of interstitials were considered. One involved P and S 2- , the other involved P 3 + and S 3- . Results showed that the latter would be more possible than the former, which confirms the results of our previous electron paramagnetic resonance study on the p-type doping of P + -implanted CuInS 2 .
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