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Laser-irradiated zinc oxide thin-film transistors fabricated by solution processing
Journal article

Laser-irradiated zinc oxide thin-film transistors fabricated by solution processing

Ya-Hui Yang, Sidney S. Yang and KAN-SEN CHOU
Journal of the Society for Information Display, Vol.18(10), pp.745-748
10/2010

Abstract

Laser annealing Solution process Zinc oxide
This study investigates the effects of subjecting zinc oxide (ZnO) thin films to laser irradiation. The optical, structural, and electrical properties of the as-deposited and laser-irradiated films at different laser energies were studied. The transmittances without/with laser irradiation showed a net increase from 85 to 92% (@550 nm) for 250-nm ZnO films, indicating an improvement in sample crystallinity. In addition, laser treatment decreased the ZnO band gap. Composition structure analysis shows that the crystallinity increased when the laser energy increased. Thin-film transistors (TFTs) with a ZnO active layer were fabricated. The mobility of as-deposited ZnO TFT devices (0.1 9 cm 2 /V-sec) increased more than 2.5 times for ZnO of unirradiated laser treatment (0.49 cm 2 /V-sec). © Copyright 2010 Society for Information Display.

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